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위・아래
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•진공의 기초
•스피터의 원리
•이온건의 원리
•진공여과 아크의 원리
•화학 기상증착의 원리
•건식 애칭의 원리
•박막중착
•시퀀스제어
•진공형성
•문제점의 해결
•펌핑속도
•기술정책리포트-기술융합시대의도래
•Society of vacuum coaters-Glossary of terms and acronyms for vacuum coating technology
•Based on the NanoSPRINT Encyclopedia of Carbon Nanotubes
•Microstructural_Control_of_Plasma-Sputtered_ Refractory_Coatings
위・아래
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PV - related
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•Energy Technology Prospect
•Photovoltaic Industry. There is no problems in growing sustainably.
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PVD
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•Characterization of Cu(In,Ga)Se2 thin lms prepared by RF magnetron sputtering using a single target without selenization
•Carbon nanotube-based field emitters
•Enhanced sensitivity of a gas sensor incorporating single-walled carbon nanotube-polypyrrole nanocomposites
•Thin-film barriers using transparent conducting oxides for organic light-emitting diodes
•Adhesion test of carbon nanotube film coated onto transparent conducting substratess
•Electrochemical properties of high-power supercapacitors using single-walled carbon nanotube electrodes
•Absorption spectroscopy of surfactant-dispersed carbon nanotube film; Modulation of electronic structures
•A selective oxidation on metallic carbon nanotubes by halogen oxoanions
•Effect of acid treatment on carbon nanotube-based flexible transparent conducting films
•Terahertz electrical and optical characteristics of double-walled carbon nanotubes and their comparison with single-walled carbon nanotubes
•Enhanced sensitivity of a gas sensor incorporating single-walled carbon nanotube-polypyrrole nanocomposites
•High-capacitance supercapacitor using a nanocomposite electrode of single-walled carbon nanotube and polypyrrole
•Terahertz conductivity of anisotropic singlewalled carbon nanotube films
•Applications of carbon nanotubes to energy storage devices
•X-ray photoemission spectroscopy study of fluorinated single-walled carbon nanotubes
•Characterization of carbon nanotubes by THz time domain spectroscopy
•Characterization of supercapacitors using singlewalled carbon nanotubes electrodes
•High-yield purification process of singlewalled carbon nanotubes
•Supercapacitors using single-walled carbon nanotube electrodes
•High yield purification of multiwalled carbon nanotubes by selective oxidation during thermal annealing
•Catalytic Growth of beta-Ga2O3 Nanowires by Arc Discharge
•Catalytic Growth of beta-Ga2O3 Nanowires by Arc Discharge
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CVD
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•Low-temperature graphene growth using epochal catalyst of PdCo alloyn
•AC Response to Gas Exposure in Vertically Aligned Multiwalled Carbon Nanotube Electrode
•Contact resistance between metal and carbon nanotube interconnects: Effect of work function and wettability
•Adaptive Logic Circuits with Doping-Free Ambipolar Carbon Nanotube Transistors
•Applications of Carbon Nanotubes to Electron Emiltters
•Analysis of hopping conduction in semiconducting and metallic carbon nanotube devices
•Alumina-coated silicon-based nanowire arrays for high quality Li-ion battery anodes
•Controlled Growth of Semiconducting Nanowire, Nanowall, and Hybrid Nanostructures on Graphene for Piezoelectric Nanogenerators
•Botryoidal growth of crystalline ZnO nanoparticles on a forest of single-walled carbon nanotubes by atomic layer deposition
•Thermionic Field Emission Transport in Carbon Nanotube Transistors
•Ultra-Transparent, Flexible Single-walled Carbon Nanotube Non-volatile Memory Device with an Oxygen-decorated Graphene Electrode
•A tunable carbon nanotube polarizer
•Aspect ratio has no eVect on genotoxicity of multi-wall carbon nanotubes
•Carbon nanotube-clamped metal atomic chain
•CRITERIA FOR PRODUCING YARNS FROM VERTICALLY ALIGNED CARBON NANOTUBES
•Anomalous Electrokinetic Dispersion of Carbon Nanotube Clusters in Liquid Crystal Under Electric Field
•Analysis of hopping conduction in semiconducting and metallic carbon nanotube devices
•ATOMIC HYDROGEN-DRIVEN SIZE CONTROL OF CATALYTIC NANOPARTICLES FOR SINGLE-WALLED CARBON NANOTUBE GROWTH
•Chirality-specific transport phenomena of isolated single-walled carbon nanotube
•Unusual double four-lobe textures generated by the motion of carbon nanotubes in a nematic liquid crystal
•A strategy for forming robust adhesion with the substrate in a carbon-nanotube field-emission array
•Anisotropic electrical conductivity of MWCNT/PAN nanofiber paper
•Carbon Nanotube-Based Field Emitters
•Characterization of thin multi-walled carbon nanotubes synthesized by catalytic chemical vapor deposition
•Anomalies in the Growth Temperature and Time Dependence of Carbon Nanotube Growth
•Band filling and correlation effects in alkali metal doped carbon nanotubes
•High-Yield Purification Process of Singlewalled Carbon Nanotubes
•Carbon Nanotube-Based Field Emitters
•CRITERIA FOR PRODUCING YARNS FROM VERTICALLY ALIGNED CARBON NANOTUBES
•Enhanced Light Output Power of GaN Light-Emitting Diodes with Graphene Film as a Transparent Conducting Electrode
•Transfer-Free Growth of Few-Layer Graphene by Self-Assembled Monolayerse
•(ref3)
•(ref4)
•Synthesis of Large-Area Graphene Layers on Poly-Nickel Substrate by Chemical Vapor Deposition: Wrinkle Formation
•Synthesis of uniformly distributed carbon nanotubes on a large area of Si substrates by thermal chemical vapor deposition
위・아래
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Dry Etch
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위・아래
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•High density plasma etching of amorphous CoZrNb films for thin film magnetic devices
•High Density Plasma Etching of IrRu Thin Films as a New Electrode for FeRAM
•Inductively Coupled Plasma Reactive Ion Etching of GeSbTe Thin Films in a HB
•Etch Characteristics of Nickel Oxide Thin Films Using Inductively Coupled Plas
•Etch characteristics of magnetic tunnel junction stack with nanometer-sized patterns for magnetic random access memory
•Inductively coupled plasma reactive ion etching of ZnO films in HBr/Ar lasma
•Etch characteristics of FePt magnetic thin films using inductively coupled plasma reactive ion etching
•Etch characteristics of gallium indium zinc oxide thin films in a HBr/Ar plasma
•Etch characteristics of indium zinc oxide thin films in a C2F6/Ar plasma
•Etch characteristics of indium zinc oxide thin films using inductively coupled plasma of a Cl2/Ar gas
•Etch characteristics of IrMn thin films using an inductively coupled plasma of CH3OH/Ar
•Evolution of etch profile in etching of CoFeB thin films using high density plasma reactive ion etching
•Inductively Coupled Plasma Reactive Ion Etching of Gallium Indium Zinc Oxide Thin Films Using Cl2/Ar Gas Mix
•Inductively coupled plasma reactive ion etching of titanium thin films using a Cl2/Ar gas
•Investigation on etch characteristics of MgO thin films using a HBr/Ar plasma
•Investigation on Etch Characteristics of Nanometer-Sized Magnetic Tunnel Junction Stacks Using a HBr/Ar Plasma
•Evolution of Etch Profile of Magnetic Tunnel Junction Stacks Etched in a CH3OH/Ar Plasma
•High density plasma reactive ion etching of CoFeB magnetic thin films using a CH4/Ar plasma
•Inductively coupled plasma reactive ion etching of IrMn magnetic thin films using a CH4/O2/Ar gas
•Inductively coupled plasma reactive ion etching of FePt magnetic thin films in a CH4/O2/Ar plasma
•Inductively coupled plasma reactive ion etching of FePt magnetic thin films in a CH4/O2/Ar plasma Junction Stacks Etched in a CH 4/O2/Ar Plasma
•Investigation on etch characteristics of FePt thin films using a H2O/Ar plasma
•Etch characteristics of CoFeB magnetic thin films using high density plasma of a H2O/CH4/Ar gas mixture
•Selective Etching of Magnetic Tunnel Junction Materials Using CO/NH3 Gas Mixture in Radio Frequency Pulse-Biased Inductively Coupled Plasmas